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Oehrlein, Arsenault Highly Cited Worldwide

Oehrlein, Arsenault Highly Cited Worldwide

Two MSE faculty members, Professor Gottleib Oehrlein (joint, Institute for Research in Electronics and Applied Physics) and Professor Emeritus Richard J. Arsenault, are recognized as being among the 250 most highly cited authors in their discipline over the past three decades by Thomson Reuters' ISIHighlyCited.com web site. According to the site, these authors represent the researchers "who have contributed to the progress of science through their insight and accomplishments."

For almost half a century, Thomson Reuters has provided citation indexes of top scholarly works in the sciences, arts and humanities. Its services include the Web of Science and Web of Knowledge, which are licensed to universities and corporations around the world.

Oehrlein is the director of the Laboratory for Plasma Processing of Materials. His research interests include low-temperature plasma science and technology, plasma and process diagnostics, plasma-surface interactions, physics and chemistry of micro- and nanostructure fabrication, novel materials, and surface physics and chemistry. In 2007, he spent his sabbatical at the Max-Planck Institut für Plasmaphysik, where he participated in research on plasma-materials interactions for fusion reactor design.

Arsenault, who retired in 2000, specialized in mechanical properties of materials and metal matrix composites.

"This is an honor not only for our professors, but also for the Clark School and the University of Maryland," says MSE Professor and Chair Robert M. Briber. "The quantity of research our faculty publish in top journals, combined with the frequency with which they're considered the go-to experts in their fields by their peers, reflects the quality of our work and enhances our reputation."

For More Information:

Browse the list of University of Maryland Professors on ISIHighlyCited.com »

Related Articles:
Plasma for Disinfection Study Wins DOE Grant
Oehrlein Receives IBM Faculty Award
Bruce Wins 2009 AVS Student Merit Award
Alumnus Publishes Book on Plasma Etching
Oehrlein Studies Plasma/Wall Interactions on Sabbatical
Oehrlein Receives 2005 Prize in Plasma Science and Technology

February 22, 2010


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